Chemical vapor deposited silicon carbide mirrors for extreme ultraviolet applications

Optical Engineering

Volumn 36, Issue 1, 1997, Pages 157-161

  Keski Kuha, Ritva A M ^a   Osantowski, John F ^a   Leviton, Douglas B ^a   Saha, Timo T ^a,b   Wright, Geraldine A ^a,b   Boucarut, Rene A ^a   Fleetwood, Charles M ^a   Madison, Timothy J ^a  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

^b SPIE ^*

Author keywords

CVD SiC; Extreme ultraviolet; FUV; Optical materials; Silicon carbide

Indexed keywords

EID: 0042682656     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.601128     Document Type: Article

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