Accelerator SIMS at PSI/ETH Zurich

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 123, Issue 1-4, 1997, Pages 575-578

  Ender, R M ^a   Dobeli M ^a   Suter, M ^a   Synal, H A ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CESIUM; ION BEAMS; ION SOURCES; IONIZATION CHAMBERS; SPUTTERING; TRACE ELEMENTS; TUNING;

ACCELERATOR MASS SPECTROMETRY;

SECONDARY ION MASS SPECTROMETRY;

EID: 0042632403     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00416-8     Document Type: Article

References (8)

1. K.H. Purser, A.E. Litherland and J.C. Rucklidge, Surf. Interface Anal. 1 (1979) 12.
2. M. Döbeli, P.W. Nebiker, M. Suter, H.-A. Synal and D. Vetterli, Nucl. Instr. and Meth. B 85 (1994) 770.
3. R.M. Ender, M. Döbeli, P.W. Nebiker, M. Suter, H.-A. Synal and D. Vetterli, in: Proc. SIMS X, eds. A. Benninghoven et al. (Wiley, New York) in press.
4. K. Wittmaack, Int. J. Mass Spectrom. Ion Process. 143 (1995) 19.
5. H.-A. Synal, G. Bonani, R.C. Finkel, Th.R. Niklaus, M. Suter and W. Wölfli, Nucl. Instr. and Meth. B 56/57 (1991) 864.
6. M. Suter, R. Balzer, G. Bonani and W. Wölfli, Nucl. Instr. and Meth. B 5 (1984) 242.
7. R.G. Wilson, F.A. Stevie and C.W. Magee, in: Secondary Ion Mass Spectrometry (Wiley, New York, 1989).
8. K. Graff, in: Metal Impurities in Silicon-Device Fabrication (Springer, Berlin, 1995).