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Materials Science and Engineering B

Volumn 47, Issue 1, 1997, Pages 78-86

Transient recrystallization of amorphous silicon films

(2) Viatella, J a Singh, R K a

a UNIVERSITY OF FLORIDA (United States)

Author keywords

Silicon films; Thin film transistors; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; ANNEALING; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLIZATION; ELECTRIC PROPERTIES; EXCIMER LASERS; GRAIN SIZE AND SHAPE; THIN FILM TRANSISTORS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

LASER INTERACTIONS; RAPID THERMAL ANNEALING (RTA);

AMORPHOUS SILICON;

EID: 0042599283 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(96)01887-9 Document Type: Article

Times cited : (5)

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