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European Physical Journal D

Volumn 24, Issue 1-3, 2003, Pages 385-388

Effect of ion irradiation on C60 thin films: Ion-irradiation-induced resistance to photopolymerization

(4) Narumi, K a Xu, Y a Miyashita, K b Naramoto, H a

a JAPAN ATOMIC ENERGY AGENCY (Japan)

b Gunma Prefectural Industrial Technology Research Laboratory (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; ION BOMBARDMENT; IONS; THIN FILMS;

C 60; EFFECT OF IONS; INDUCED RESISTANCE; ION FLUENCES; IONS IRRADIATION; LATTICE DISORDERS; PHOTO POLYMERIZATION; RESISTANCE INCREASE; THIN-FILMS; TOPOCHEMICAL;

PHOTOPOLYMERIZATION;

EID: 0042572385 PISSN: 14346060 EISSN: None Source Type: Journal
DOI: 10.1140/epjd/e2003-00150-5 Document Type: Conference Paper

Times cited : (4)

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