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Applied Physics Letters

Volumn 53, Issue 20, 1988, Pages 1943-1945

Contact resistance to undoped and phosphorus-doped hydrogenated amorphous silicon films

(1) Kanicki, Jerzy a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042480854 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.100330 Document Type: Article

Times cited : (44)

References (14)

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4
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5
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6
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7
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- Wronski, C.R.¹ Carlson, D.E.²

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- Kanicki, J.¹ Ranson, C.M.² Bauhofer, W.³ Chappell, T.I.⁴ Scott, B.A.⁵

9
- 0022201162
- edited by J. D. Chadi and W. A. Harroson (Springer, New York)
- (1985) Proceedings of l7th International Conference on Physics of Semiconductors , pp. 183
- Kanicki, J.¹ Osama Aboelfotoh, M.² Bauhofer, W.³

10
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- Yu, A.Y.C.¹

11
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12
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- Kanicki, J.¹

14
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- Matsuura, H.¹ Oktno, T.² Okushi, H.³ Yamasaki, S.⁴ Matsuda, A.⁵ Hata, N.⁶ Oheda, H.⁷ Tanaka, K.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.