Relative contrast in a-Si and c-Si in ADF-STEM imaging

Microscopy and Microanalysis

Volumn 9, Issue SUPPL. 2, 2003, Pages 848-849

  Yu, Z ^a   Muller, D A ^b   Silcox, J ^c  

^a School of Operations Research and Industrial Engineering   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042422064     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/s1431927603444243     Document Type: Conference Paper

References (4)

1. R. F. Loane, E. J. Kirkland and J. Silcox, Acta Cryst, A44, 912 (1988).
2. S. Hillyard, R. F. Loane and J. Silcox, Ultramicroscopy 49, 14 (1993).
3. G. Duscher et al., Characterization and Metrology for ULSI Technology (1998), p.191.
4. Z. Yu, D.A. Muller, F. Baumann, J. Silcox, "Contrast effect of strain field in ADF-STEM imaging", Microscopy and Microanalysis 2001 (Springer), p.186.