Challenges remain for 157-nm lithography

Laser Focus World

Volumn 37, Issue 7, 2001, Pages

  McClay, James ^b   Fahey, Thomas ^b   Lipson, Matthew ^a  

^a ASML US Inc   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042403687     PISSN: 10438092     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (2)

1. T. Fahey, J. McClay, M. Hansen, B. Tirri, and M. Lipson, SPIE Post Paper, SVGL 157-nm Lithography Technical Review, February 2001.
2. Laura Peters, Resist Developers Try to Beat the Clock, Semiconductor International, 24 (February 2001).