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Volumn 25, Issue 2, 1996, Pages 60-65
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Extending the Possibilities of Soft X-Ray Spectrometry Through the Etching of Layered Synthetic Microstructure Monochromators
a,d a a b c c c c
d
CAMECA
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
DIFFRACTION GRATINGS;
ELECTRON BEAM LITHOGRAPHY;
ELECTRON PROBE MICROANALYSIS;
MONOCHROMATORS;
REACTIVE ION ETCHING;
SILICON COMPOUNDS;
SPECTROMETRY;
TRACE ELEMENTS;
X RAY SPECTROMETERS;
BRAGG ANGLES;
ELECTRON PROBE MICROANALYSES;
ELECTRON-PROBE MICROANALYSIS;
GLANCING ANGLE;
SOFT X-RAY;
SPECTROMETRY TECHNIQUE;
SPECULAR REFLECTIONS;
WAVELENGTH DISPERSIVE SPECTROMETERS;
X RAY FLUORESCENCE;
X RAY SPECTROMETRY;
MICROSTRUCTURE;
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EID: 0042374652
PISSN: 00498246
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1097-4539(199603)25:2<60::AID-XRS138>3.0.CO;2-2 Document Type: Article |
Times cited : (17)
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References (9)
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