Surface characterization of titanium dioxide powder treated by the CH4-H2 plasma CVD method

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 882-885

  Sugiyama, Kazuo ^a   Ogawa, Takayuki ^b   Saito, Norihiko ^a   Hosoya, Yukio ^a   Yajima, Tatsuhiko ^b  

^a SAITAMA UNIVERSITY   (Japan)

^b SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Photocatalyst; Plasma CVD; Titanium dioxide; Visible light

Indexed keywords

CRYSTALLINE MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MICROWAVES; PHOTOCATALYSIS; TITANIUM DIOXIDE;

ULTRAVIOLET IRRADIATION;

SURFACE TREATMENT;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042353624     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00572-3     Document Type: Article

References (7)

1. Discher B. Brandt G. Ind. Diamond Rev. 8/85 1985 131
2. Spitsyn B.V. Boulov L.L. Derjaguin B.V. Cryst. Growth 52 1981 219
3. Matsumoto S. Sato Y. Kamo M. Setaka N. Jpn. J. Appl. Phys. 21 1982 L183
4. Sugiyama K. Saito N. Hosoya Y. J. Surf. Fin. Soc. Jpn. 52 2001 147
5. Sugiyama K. Nakano Y. Aoki H. Takeuchi Y. Matsuda T. J. Mater. Chem. 4 1994 1497
6. Briggs D. Seah M.P. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy 1983 Wiley New York
7. Busca B. J. Chem. Soc. Faraday Trans. II 90 1994 3181