X-ray photoelectron spectroscopy studies of GeXSb40-XS60 Films

Journal of Optoelectronics and Advanced Materials

Volumn 3, Issue 4, 2001, Pages 841-846

  Jiang, L ^a   Fitzgerald, A G ^a   Rose, M J ^a   Christova, K ^b   Manov, A ^b   Pamukchieva, V ^b  

^a UNIVERSITY OF DUNDEE   (United Kingdom)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

Chalcogenide films; Stress; XPS

Indexed keywords

ANTIMONY; ANTIMONY COMPOUNDS; BINDING ENERGY; CHALCOGENIDES; ELECTRONIC STRUCTURE; GERMANIUM; PHOTOELECTRON SPECTROSCOPY; PHOTONS; STRESSES; X RAY PHOTOELECTRON SPECTROSCOPY;

AVERAGE COORDINATION NUMBER; CHALCOGENIDE FILMS; INTENSITY RATIO; MECHANICAL STRESS; PHOTOELECTRON PEAKS; SUBSTRATE SYSTEM; X RAY PHOTOELECTRON SPECTRA; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

PHOTOELECTRONS;

EID: 0042291985     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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