Feasibility of plasma nitriding for effective surface treatment of pure aluminum

Materials Transactions

Volumn 44, Issue 7, 2003, Pages 1412-1418

  Visuttipitukul, Patama ^a   Aizawa, Tatsuhiko ^a   Kuwahara, Hideyuki ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b RESEARCH INSTITUTE FOR APPLIED SCIENCES   (Japan)

Author keywords

Aluminum; Aluminum nitride; Plasma nitriding; Sputtering

Indexed keywords

FILMS; HYDROGEN; NITRIDING; NITROGEN; OXIDES; PLASMA APPLICATIONS; SPUTTERING; SURFACE TREATMENT; THERMAL EFFECTS; THERMAL EXPANSION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA NITRIDING; PRESPUTTERING; PURE ALUMINUM; SURFACE OXIDE FILM;

ALUMINUM;

EID: 0042282644     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.44.1412     Document Type: Article

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