ArF surface modification resist process with enhanced water sorption ability

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4212-4215

  Matsuo, Takahiro ^a   Endo, Masayuki ^a   Shirai, Masamitsu ^b   Tsunooka, Masahiro ^b  

^a PANASONIC CORPORATION   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042237265     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588577     Document Type: Article

References (10)

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