Characteristics of plasma processed SiC nanocrystallites and nanorods

Applied Physics Letters

Volumn 83, Issue 3, 2003, Pages 548-550

  Qadri, S B ^a   Imam, M A ^a   Feng, C R ^a   Rath, B B ^a   Yousuf, M ^b   Singh, S K ^c  

^a NAVAL RESEARCH LABORATORY   (United States)

^b GEORGE WASHINGTON UNIVERSITY   (United States)

^c CSIR INSTITUTE OF MINERALS AND MATERIALS TECHNOLOGY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; GRAPHITE ELECTRODES; LATTICE CONSTANTS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STACKING FAULTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY POWDER DIFFRACTION;

NANORODS;

SILICON CARBIDE;

EID: 0042126691     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1594831     Document Type: Article

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