Atomic layer deposition growth of zirconium doped In2O 3 films

Thin Solid Films

Volumn 440, Issue 1-2, 2003, Pages 152-154

  Asikainen, Timo ^a,b   Ritala, Mikko ^a   Leskelä, Markku ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

^b ASM Microchemistry Oy   (Finland)

Author keywords

Deposition process; Indium oxide; Zirconium

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); INDIUM COMPOUNDS; POLYCRYSTALLINE MATERIALS; TRANSPARENCY; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM;

ATOMIC LAYER DEPOSITION;

THIN FILMS;

EID: 0042121563     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00822-8     Document Type: Article

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