Polytypes and crystallinity of ultrathin epitaxial films of layered materials studied with grazing incidence X-ray diffraction

Surface Science

Volumn 369, Issue 1-3, 1996, Pages 379-384

  Shimada, Toshihiro ^a   Nishikawa, Hiroyuki ^a   Koma, Atsushi ^a   Furukawa, Yukito ^b   Arakawa, Etsuo ^c   Takeshita, Kunikazu ^d   Matsushita, Tadashi ^c,d  

^a UNIVERSITY OF TOKYO   (Japan)

^b KOBE STEEL LTD   (Japan)

^c GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^d HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

Author keywords

Epitaxy; Gallium arsenide; Metal semiconductor non magnetic thin film structures; Niobium selenide; Tantalum selenide; X ray scattering, diffraction and reflection

Indexed keywords

EPITAXIAL GROWTH; FILM GROWTH; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING SELENIUM COMPOUNDS; SURFACE STRUCTURE; TANTALUM COMPOUNDS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

NIOBIUM SELENIDE; TANTALUM SELENIDE; X RAY SCATTERING;

ULTRATHIN FILMS;

EID: 0042093413     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)00915-6     Document Type: Article

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