Fabrication of photonic crystal waveguide elements on SOI

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4944, Issue , 2002, Pages 23-31

  Yliniemi, Sanna ^a,b   Aalto, Timo ^a   Heimala, Päivi ^a   Pekko, Panu ^a   Jefimovs, Konstantins ^c   Simonen, Janne ^c   Uusitupa, Tero ^b  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b AALTO UNIVERSITY   (Finland)

^c UNIVERSITY OF EASTERN FINLAND   (Finland)

Author keywords

E beam; Inductively coupled plasma etching (ICP); Photonic crystal; Silicon on insulator (SOI)

Indexed keywords

FINITE DIFFERENCE METHOD; PLASMA ETCHING; SILICON ON INSULATOR TECHNOLOGY; TIME DOMAIN ANALYSIS;

INDUCTIVELY COUPLED PLASMA ETCHING; PHOTONIC BAND GAP EFFECT; PHOTONIC CRYSTAL;

DIELECTRIC WAVEGUIDES;

EID: 0042063785     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468303     Document Type: Conference Paper

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