Nondestructive multiple breakdown events in very thin SiO2 films

Applied Physics Letters

Volumn 55, Issue 2, 1989, Pages 128-130

  Sune J ^a   Farres E ^a   Placencia, I ^a   Barniol, N ^a   Martin F ^a   Aymerich, X ^a  

^a UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042026376     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.102396     Document Type: Article

References (16)