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Volumn 80, Issue 11, 1996, Pages 6286-6292

Scandium correlated deep levels in silicon

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0042000490     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363648     Document Type: Article
Times cited : (5)

References (25)
  • 3
    • 0005014282 scopus 로고
    • edited by H. R. Huff, W. Bergholz, and K. Sumino The Electrochemical Society, Pennington, NJ
    • H. Lemke, in Semiconductor Silicon, edited by H. R. Huff, W. Bergholz, and K. Sumino (The Electrochemical Society, Pennington, NJ, 1994), p. 695.
    • (1994) Semiconductor Silicon , pp. 695
    • Lemke, H.1
  • 5
    • 0037943142 scopus 로고
    • edited by H. R. Huff, T. Abe, and B. Kohlbesen The Electrochemical Society, Pennington, NJ
    • K. Graff, in Semiconductor 1986, edited by H. R. Huff, T. Abe, and B. Kohlbesen (The Electrochemical Society, Pennington, NJ, 1986), p. 751.
    • (1986) Semiconductor 1986 , pp. 751
    • Graff, K.1
  • 15
    • 85033848609 scopus 로고    scopus 로고
    • See Ref. 13, p. 375
    • See Ref. 13, p. 375.
  • 17
    • 85033862718 scopus 로고
    • Defect Engineering in Semiconductor Growth, Processing and Device Technology
    • edited by S. Ashok, J. Chevallier, K. Sumino, and E. Weber, Materials Research Society, Pittsburgh, PA
    • K. Schmalz, H. G. Grimmeiss, H. Pettersson, and L. Tilly, Defect Engineering in Semiconductor Growth, Processing and Device Technology, edited by S. Ashok, J. Chevallier, K. Sumino, and E. Weber, Mater. Res. Soc. Symp. Proc., Vol. 262 (Materials Research Society, Pittsburgh, PA, 1992), pp. 489-500.
    • (1992) Mater. Res. Soc. Symp. Proc. , vol.262 , pp. 489-500
    • Schmalz, K.1    Grimmeiss, H.G.2    Pettersson, H.3    Tilly, L.4
  • 19
    • 0003286705 scopus 로고
    • Computer Simulation of Ion-Solid Interactions
    • Springer, Berlin
    • W. Eckstein, Computer Simulation of Ion-Solid Interactions, Springer Series in Material Science, Vol. 10 (Springer, Berlin, 1991), p. 75.
    • (1991) Springer Series in Material Science , vol.10 , pp. 75
    • Eckstein, W.1
  • 22
    • 85033863073 scopus 로고    scopus 로고
    • note
    • T values of different levels are to be compared.
  • 23
    • 85033844869 scopus 로고    scopus 로고
    • note
    • No electrically inactive Ti site has been reported. In the present experiment, the Ti concentration is below the solubility at the annealing temperature and a complexing or clustering of Ti during quenching is not expected because of the low mobility of Ti.
  • 24
    • 85033869867 scopus 로고    scopus 로고
    • note
    • The pulse length was varied between 10 μs and 100 ms. The pulse length dependence of the peak height was also examined for the peaks C, D, F, G, H, and I. These peaks were not sensitive to the pulse length in the range examined as it is expected from their comparatively large cross sections σ (Table I).
  • 25
    • 85033851218 scopus 로고    scopus 로고
    • See Ref. 13, p. 433
    • See Ref. 13, p. 433.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.