Stress and environmental shift characteristics of HfO2/SiO 2 multilayer coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2966, Issue , 1997, Pages 258-264

  Anzellotti, J F ^a   Smith, Douglas J ^a   Sczupak, Robert J ^b   Chrzan, Z Roman ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

^b Barr Associates Inc   (United States)

Author keywords

Hafnia oxide; Multilayer coatings; OMEGA laser; Silicon dioxide; Spectral shift; Stress; Thin films

Indexed keywords

EVAPORATION; FILM PREPARATION; FILMS; HAFNIUM COMPOUNDS; IGNITION; LASER DAMAGE; LASERS; METALLIC COMPOUNDS; MOISTURE; MULTILAYER FILMS; MULTILAYERS; NONMETALS; OPTICAL INSTRUMENTS; OPTICAL MATERIALS; OPTICAL MULTILAYERS; OXIDE FILMS; OXIDES; OXYGEN; PLASMAS; POLARIZATION; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON COMPOUNDS; THIN FILMS; VAPORS;

HAFNIA OXIDE; MULTILAYER COATINGS; OMEGA LASER; SILICON DIOXIDE; SPECTRAL SHIFT;

COATINGS;

EID: 0041980766     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.274221     Document Type: Conference Paper

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