Emissivity modeling of metals during the growth of oxide film and comparison of the model with experimental results

Applied Optics

Volumn 42, Issue 13, 2003, Pages 2317-2326

  Iuchi, Tohru ^a   Furukawa, Tohru ^a   Wada, Shigenobu ^b  

^a TOYO UNIVERSITY   (Japan)

^b Chino Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; FILM GROWTH; LIGHT POLARIZATION; METALS; OXIDES;

OXIDE FILMS; RADIATION THERMOMETRY;

LIGHT EMISSION;

EID: 0041972226     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.002317     Document Type: Article

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