W/SiC x–ray multilayers optimized for use above 100 keV

Applied Optics

Volumn 42, Issue 13, 2003, Pages 2415-2421

  Windt, David L ^a   Donguy, Soizik ^a   Hailey, Charles J ^a   Koglin, Jason ^a   Honkimaki, Veijo ^b   Ziegler, Eric ^b   Christensen, Finn E ^c   Chen, Hubert ^d   Harrison, Fiona A ^d   Craig, William W ^e  

^a Och Spine at New York Presbyterian Hospitals   (United States)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^d CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^e LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

REFLECTIVE COATINGS; SILICON CARBIDE; SYNCHROTRON RADIATION; TUNGSTEN; X RAYS;

X-RAY REFLECTANCE;

MULTILAYERS;

EID: 0041971523     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.42.002415     Document Type: Article

References (18)

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18. The optical constants that we derived here will be included with the next release of IMD, available at http://cletus.phys. columbia.edu/windt/imd.