Photorefractive lithography with synchrotron light in poly(methyl methacrylate)

Applied Physics Letters

Volumn 83, Issue 6, 2003, Pages 1116-1118

  Andreas, B ^a   Peithmann, K ^a   Soergel, E ^a   Buse, K ^a  

^a UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED OPTICS; LIGHTING; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; REFRACTIVE INDEX;

SYNCHROTRON LIGHT;

POLYMETHYL METHACRYLATES;

EID: 0041924975     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1600507     Document Type: Article

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