Spectroscopic ellipsometry study of a self-organized Ge dot layer

Journal of Applied Physics

Volumn 94, Issue 4, 2003, Pages 2248-2253

  Gallas, B ^a   Rivory, J ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PROPERTIES; ELLIPSOMETRY; EPITAXIAL GROWTH; ETCHING; GERMANIUM; INCLUSIONS; LIGHT ABSORPTION; OXIDATION; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE ACTIVE AGENTS; ULTRAVIOLET RADIATION;

DIELECTRIC FUNCTIONS;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0041923683     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1592882     Document Type: Article

References (25)

1. M. Broschwitz, K. Dettmer, and J. Schoenes, Appl. Phys. Lett. 77, 367 (2000).
2. J. Humliček, M. Garriga, M. I. Alonso, and M. Cardona, J. Appl. Phys. 65, 2827 (1989).
3. C. Pickering, R. T. Carline, D. J. Robbins, W. Y. Leong, S. J. Barnett, A. D. Pitt, and A. G. Cullis, J. Appl. Phys. 73, 239 (1993).
4. J. L. Freeouf, J. C. Tsang, F. K. LeGoues, and S. S. Iyer, Phys. Rev. Lett. 64, 315 (1990).
5. I.-M. Lee and C. G. Takoudis, J. Vac. Sci. Technol. A 15, 3154 (1997).
6. J. E. Hulse, L. M. Heller, and S. J. Rolfe, Thin Solid Films 248, 140 (1994).
7. R. T. Carline, C. Pickering, P. Calcott, D. J. Robbins, W. Y. Leong, A. D. Pitt, S. J. Barnett, and A. G. Cullis, Superlattices Microstruct. 14, 157 (1993).
8. H. Akazawa, Thin Solid Films 369, 157 (2000).
9. G. Theodorou, C. Tserbak, and N. D. Vlachos, J. Appl. Phys. 78, 3600 (1995).
10. P. Tognini, L. C. Andreani, M. Geddo, A. Stella, P. Cheyssac, R. Kofman, and A. Migliori, Phys. Rev. B 53, 6992 (1996).
11. M. Han, Y. Gong, J. Ma, F. Liu, and G. Wang, Jpn. J. Appl. Phys., Part 1 34, 49 (1995).
12. C. W. Teng, J. F. Muth, R. M. Kolbas, K. M. Hassan, A. K. Sharma, A. Kvit, and J. Narayan, Appl. Phys. Lett. 76, 43 (2000).
13. K. L. Teo, S. H. Kwok, P. Y. Yu, and S. Guha, Phys. Rev. B 62, 1584 (2000).
14. O. Brafman, M. A. Araújo Silva, F. Cerdeira, R. Manor, and J. C. Bean, Phys. Rev. B 51, 17800 (1995).
15. S. H. Kwok, P. Y. Yu, C. H. Tung, Y. H. Zhang, M. F. Li, C. S. Peng, and J. M. Zhou, Phys. Rev. B 59, 4980 (1999).
16. B. Gallas and J. Rivory, Physica E (Amsterdam) 17 549 (2003).
17. A. Portavoce, F. Volpi, A. Ronda, P. Gas, and I. Berbezier, Thin Solid Films 380, 164 (2000).
18. G. E. Jellison, T. E. Haynes, and H. H. Burkes, Opt. Mater. (Amsterdam, Neth.) 2, 105 (1993).
19. D. E. Aspnes and A. A. Studna, Phys. Rev. B 27, 985 (1983).
20. A. R. Forouhi and I. Bloomer, Phys. Rev. B 34, 7018 (1986).
21. K. Sumitomo, K. Shiraishi, Y. Kobayashi, T. Ito, and T. Ogino, Thin Solid Films 369, 112 (2000).
22. O. G. Schmidt, U. Denker, and S. Christiansen, Appl. Phys. Lett. 81, 2614 (2002).
23. W. Kissinger, H. J. Osten, G. Lippert, B. Dietrich, and E. Bugiel, J. Appl. Phys. 76, 8042 (1994).
24. H.-Ch. Weissker, J. Furthmüller, and F. Bechstedt, Phys. Rev. B 65, 155327 (2002); 65, 155328 (2002).
25. H.-Ch. Weissker, J. Furthmüller, and F. Bechstedt, Phys. Rev. B 65, 155327 (2002); 65, 155328 (2002).