The technology combined electrochemical mechanical polishing

Journal of Materials Processing Technology

Volumn 140, Issue 1-3 SPEC., 2003, Pages 203-205

  Chen, Yuan Long ^a   Zhu, Shu Min ^a   Lee, Shuo Jen ^b   Wang, Jong C ^b  

^a HEFEI UNIVERSITY OF TECHNOLOGY   (China)

^b YUAN ZE UNIVERSITY   (Taiwan)

Author keywords

Combined technology; Electrochemical polishing; Mechanical polishing

Indexed keywords

ABRASIVES; CURRENT DENSITY; ELECTROCHEMISTRY; ELECTROLYTES; SURFACE ROUGHNESS;

METAL REMOVAL;

CHEMICAL MECHANICAL POLISHING;

EID: 0041909916     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(03)00826-4     Document Type: Conference Paper

References (3)

1. X.G. An, Q. Shong, Research on the Combined ElectroChemical Mechanical Polishing, Electro Machining, No. 2, 2002.
2. X.S. Zhao, The combined electrochemical mechanical polishing and pulse current electrochemica polishing, Masters Thesis, Hefei University of Technology, 2000.
3. J.Y. Wang, J.W. Xu, The Principle and Applications of Electrochemical Machining, National Defense Industry Press, Beijing, 2001.