Analysis of Semiconducting Materials by High-Resolution Radiofrequency Glow Discharge Mass Spectrometry

Mikrochimica Acta

Volumn 125, Issue 1, 1997, Pages 41-44

  Jäger, Ralf ^a   Saprykin, Anatolij I ^c   Becker, J Sabine ^a   Dietze, Hans Joachim ^a   Broekaert, José A C ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b TU DORTMUND UNIVERSITY   (Germany)

^c NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Energy distribution; Mass spectrometry; Radiofrequency glow discharge

Indexed keywords

EID: 0041809642     PISSN: 00263672     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf01246160     Document Type: Article

References (8)

1. J. W. Coburn, Thin Solid Films 1989, 171, 65.
2. R. K. Marcus, J. Anal. At. Spectrom. 1993, 8, 935.
3. C. R. Shick Jr., A. Raith, R. K. Marcus, J. Anal. At. Spectrom. 1994, 9, 1045.
4. D. C. Duckworth, D. L. Donohue, D. H. Smith, T. A. Lewis, R. K. Marcus, Anal. Chem. 1993, 65, 2478.
5. A. I. Saprykin, F.-G. Melchers, J. S. Becker, H.-J. Dietze, Fresenius J. Anal. Chem. 1995, 353, 570.
6. J. Franzen, H. Z. Hintenberger, Naturforschung 1961, 16a, 535.
7. N. Fürstenau, F. Hillenkamp, Int. J. Mass. Spectrom. Ion. Processes 1981, 37, 135.
8. G. Seifert, J. S. Becker, H.-J. Dietze, Int. J. Mass Spectrom Ion Processes 1988, 84, 121.