Electronic band structure of passive film on X70 pipeline steel

Electrochimica Acta

Volumn 48, Issue 23, 2003, Pages 3551-3562

  Zeng, Y M ^a   Luo, J L ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

Electronic property; Mott Schottky; Passive film; Photocurrent

Indexed keywords

CAPACITANCE; ELECTRONIC STRUCTURE; IONS; METALLIC FILMS; PHOTOCURRENTS; STEEL;

PASSIVE FILMS;

ELECTROCHEMISTRY;

EID: 0041782616     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(03)00477-8     Document Type: Article

References (45)

1. Cabrera N., Mott N.F. Rep. Prog. Phys. 12:1948;267.
2. Macdonald D.D. Pure Appl. Chem. 71:1999;951.
3. Sato N., Cohen M. J. Electrochem. Soc. 111:1964;512.
4. J.E.O. Mayne, M.J. Pryor, J. Chem. Soc. (1949) 1831.
5. Cohen M. J. Phys. Chem. 56:1952;451.
6. Cahan B.D., Chen C.T. J. Electrochem. Soc. 129:1982;923.
7. Sato N., Kudo K., Nishimuru R. J. Electrochem. Soc. 123:1976;1419.
8. Okamoto G. Corros. Sci. 13:1973;471.
9. Hashimoto K., Asami K. Corros. Sci. 19:1979;251.
10. Di Paola A., Shukla D., Stimming U. Electrochim. Acta. 36:1991;345.
11. Simoes A.M.P., Ferreira M.G.S., Loran G. Electrochim. Acta. 36:1991;315.
12. Dongil K., Kagwade S.W., Clayton C.R. Surf. Interf. Anal. 26:1998;155.
13. Clayton C.R., Olefjord I. Marcus P., Oudar J. Corrosion Mechanisms in Theory and Practice. 1995;175 Dekker, New York.
14. Mischler S., Vogel A., Mathieu H.J., Landolt D. Corros. Sci. 32:1991;925.
15. Kirchheim R., Heine B., Fischmeister H. Corros. Sci. 29:1989;899.
16. Maurice V., Yang W.P., Marcus P. J. Electrochem. Soc. 145:1998;909.
17. Costa D., Yang W.P., Marcus P. Mater. Sci. Forum. 185-188:1995;325.
18. Matsudaira M. Corrosion. 37:1981;267.
19. G. Gusmano, G. Montesperelli, S. Pacetti, in: Proceedings of the Eighth European Symposium on Corrosion Inhibitors (198th Manifestation of the European Federation of Corrosion), Vol. 1, University of Rome, Italy, p. 561.
20. Cafferty E.M. J. Electrochem. Soc. 137:1990;3731.
21. Gorse D., Rondot B., Da Cunha Belo M. Corros. Sci. 30:1989;23.
22. Koenig U., Schultze J.W. Solid State Ionics. 53-56:1992;255.
23. Abrantes L.M., Peter L.M. J. Electroanal. Chem. 150:1983;593.
24. M.J. Kloppers, F. Bellucci, in: D.R. Baer, C.R. Clayton (Eds.), Application of Surface Analysis Methods to Environmental/Material Interactions, Proceedings, Vols. 91-97, The Electrochemical Society, Pennington, NJ, 1991, p. 287.
25. Fujimoto S., Chihara O., Shibata T. Mater. Sci. Forum. 289-292:1998;989.
26. Stimming U. Froment M. Passivity of Metals and Semiconductors. 1983;477 Elsevier, Amsterdam.
27. Azumi K., Ohtsuka T., Sato N. J. Electrochem. Soc. 134:1987;1352.
28. Chen Y.F., Luo J.L. Appl. Surf. Sci. 167:2000;113.
29. J.T. Bulger, The Effect of Microstructure on Near-neutral-pH SCC, Master Thesis, University of Alberta, Edmonton, Alba, Canada, 2000, p. 90.
30. Sato N. Electrochemistry at Metal and Semiconductor Electrodes. 1998;Elsevier, Amsterdam.
31. Horowitz G. J. Electroanal. Chem. 159:1983;421.
32. Horowitz G. J. Electroanal. Chem. 159:1983;421.
33. Fredlein R.A., Bard A.J. J. Electrochem. Soc. 126:1979;1893.
34. Nagayama M., Cohen M. J. Electrochem. Soc. 109:1962;781.
35. Bardwell J.A., Graham M.J. J. Electrochem. Soc. 135:1988;413.
36. Rahner D., Forker W.Z. Phys. Chem. 18:1978;344.
37. Gerischer H. Corros. Sci. 29:1989;257.
38. Stimming U. Electrochim. Acta. 31:1986;415.
39. Khalil W., Haupt S., Strehblow H.H. Werkst. Korros. 36:1985;16.
40. Heusler K.E., Fischer L. Werkst. Korros. 27:1976;551.
41. Haart L.G., Blasse D. J. Electroanal. Chem. 132:1985;2933.
42. Chen C.T., Cahan B.D. J. Electroanal. Chem. 129:1982;17.
43. Kim J.S., Cho E.A., Kwon H.S. Corros. Sci. 43:2001;1403.
44. Davenport A.J., Sansone M. J. Electrochem. Soc. 142:1995;725.
45. Sikora E., Macdonald D.D. J. Electrochem. Soc. 147:2000;4087.