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Volumn 41, Issue 18, 2003, Pages 2091-2108

Numerical simulation of coupled-stress case II diffusion in one dimension

Author keywords

Adaptive time stepping; Case II diffusion; Glass transition; Lithography; Nonlinear coupled simulation; Viscoelasticity

Indexed keywords

COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; DIFFUSION; FINITE ELEMENT METHOD; GLASS TRANSITION; LITHOGRAPHY; MATHEMATICAL MODELS; NONLINEAR EQUATIONS; ORGANIC SOLVENTS; VISCOELASTICITY;

EID: 0041781827     PISSN: 08876266     EISSN: None     Source Type: Journal    
DOI: 10.1002/polb.10551     Document Type: Article
Times cited : (16)

References (32)
  • 1
    • 0004086734 scopus 로고    scopus 로고
    • Technical Report UCB/ERL M99/26; Electronics Research Laboratory, College of Engineering, University of California at Berkeley: Berkeley, CA
    • Croffie, E. Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation; Technical Report UCB/ERL M99/26; Electronics Research Laboratory, College of Engineering, University of California at Berkeley: Berkeley, CA, 1999.
    • (1999) Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation
    • Croffie, E.1
  • 14
    • 0004260484 scopus 로고
    • Truesdell, C., Ed.; Springer-Verlag: New York
    • Bowen, R. W. In Rational Thermodynamics; Truesdell, C., Ed.; Springer-Verlag: New York, 1984.
    • (1984) Rational Thermodynamics
    • Bowen, R.W.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.