Manufacturing technologies for miniaturized interference filters

Microsystem Technologies

Volumn 6, Issue 3, 2000, Pages 77-81

  Frank, M ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041781139     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050001     Document Type: Article

References (9)

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3. Herzig H-P (ed) (1997) Micro-optics, Elements, Systems and Applications. Taylor & Francis, London
4. Mooney TA (1997)Focal plane Microassemblies: A status Report, SPIE Vol 3221, pp. 568-580
5. 2 films deposited by RF sputtering. Surf Sci 86: 417-423
6. Ihlemann J; Wolff-Rottke B (1995) Excimer laser ablation patterning of dielectric layers. App Surf Sci 86: 228-233
7. Barrie JD; Aitchison KA; Rossano GS; Abraham MH (1995) Patterning of multilayer dielectric optical coatings for multispectral CCDs. Thin Solid Films 270: 6-9
8. Curtis BJ; Gale MT; Lehmann HW; Brunner H; Schuetz H; Widmer R (1986) Fabrication of mosaic color filters by dry-etching dielectric stacks. J Vac Sci Technol A4: 70-74
9. Frank M; Schallenberg UB; Kaiser N (1997) Micropatterned multilayer dielectric filters with two spectral characteristics. Opt Eng 36 (4): 1220-1224