Role of surface diffusion processes during bias-enhanced nucleation of diamond on Si

Diamond and Related Materials

Volumn 5, Issue 3-5, 1996, Pages 261-265

  Gerber, J ^a   Robertson, J ^b   Sattel, S ^a   Ehrhardt, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

CVD; Diamond nucleation; Nucleation; Process characterisation

Indexed keywords

EID: 0041760219     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00396-7     Document Type: Article

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