메뉴 건너뛰기




Volumn 36, Issue 1-3, 1996, Pages 179-182

Impact of the starting interstitial oxygen concentration on the electrical characteristics of electron irradiated Si junction diodes

Author keywords

Noise processes and phenomena; Oxygen; P n junctions; Silicon

Indexed keywords


EID: 0041686951     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-5107(95)01254-0     Document Type: Article
Times cited : (2)

References (17)
  • 1
    • 0006295827 scopus 로고
    • Electrochemical Society, Pennington, NJ, PV94-10
    • Semiconductor Silicon / 1994, Electrochemical Society, Pennington, NJ, PV94-10, 1994.
    • (1994) Semiconductor Silicon / 1994
  • 7
    • 0002868708 scopus 로고
    • R.H. Kingston (ed.), University of Philadelphia Press, Philadelphia
    • A.L. McWhorter, in R.H. Kingston (ed.), Semiconductor Surface Physics, University of Philadelphia Press, Philadelphia, 1957, p. 107.
    • (1957) Semiconductor Surface Physics , pp. 107
    • McWhorter, A.L.1
  • 15
    • 0042902112 scopus 로고
    • personal communication
    • H. Ohyama, personal communication, 1995.
    • (1995)
    • Ohyama, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.