Abnormal electrical resistivity in γ-TiAl thin films deposited by magnetron sputtering

Applied Physics Letters

Volumn 83, Issue 3, 2003, Pages 455-457

  Alford, T L ^a   Gadre, K S ^a   Kim, H C ^a   Deevi, S C ^b  

^a Arizona State University   (United States)

^b Chrysalis Technologies   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; DIFFUSION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; TITANIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

PROBE RESISTIVITY;

THIN FILMS;

EID: 0041625902     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1593826     Document Type: Article

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