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Volumn 440, Issue 1-2, 2003, Pages 145-151

Bias frequency, waveform and duty-cycle effects on the bias-enhanced nucleation of epitaxial diamond

Author keywords

Chemical vapor deposition; Diamond; Epitaxy; Plasma processing and deposition

Indexed keywords

CARBURIZING; CHEMICAL VAPOR DEPOSITION; DIAMONDS; NUCLEATION; PLASMA APPLICATIONS; SILICON; WAVEFORM ANALYSIS;

EID: 0041620639     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00827-7     Document Type: Article
Times cited : (4)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.