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Volumn 440, Issue 1-2, 2003, Pages 145-151
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Bias frequency, waveform and duty-cycle effects on the bias-enhanced nucleation of epitaxial diamond
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Author keywords
Chemical vapor deposition; Diamond; Epitaxy; Plasma processing and deposition
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Indexed keywords
CARBURIZING;
CHEMICAL VAPOR DEPOSITION;
DIAMONDS;
NUCLEATION;
PLASMA APPLICATIONS;
SILICON;
WAVEFORM ANALYSIS;
PULSED BIASING;
THIN FILMS;
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EID: 0041620639
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(03)00827-7 Document Type: Article |
Times cited : (4)
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References (16)
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