Selective chemical etching of latent compositional microstructures in sputtered Co-Cr films

Japanese Journal of Applied Physics

Volumn 29, Issue 9R, 1990, Pages 1705-1710

  Takahashi, Masaya ^a   Maeda, Yasushi ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

Chemical etching; Co Cr film; Compositional microstructure; Cr depth profile; Passivation

Indexed keywords

EID: 0041581321     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.29.1705     Document Type: Article

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