Chemical vapor deposition of metal borides, 4: The application of polyhedral boron clusters to the chemical vapor deposition formation of gadolinium boride thin-film materials

Applied Organometallic Chemistry

Volumn 10, Issue 3-4, 1996, Pages 297-304

  Kher, Shreyas S ^a   Tan, Yexin ^a   Spencer, James T ^a  

^a SYRACUSE UNIVERSITY   (United States)

Author keywords

Chemical vapor deposition; Gadolinium hexaboride; Mass spectrometry; Scanning electro microscopy; Thin films; X ray diffraction; X ray emission spectroscopy

Indexed keywords

EID: 0041536712     PISSN: 02682605     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0739(199604)10:3/4<297::AID-AOC460>3.0.CO;2-D     Document Type: Article

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