Dynamics of electron beam ablation of silicon dioxide measured by dye laser resonance absorption photography

Applied Physics Letters

Volumn 73, Issue 18, 1998, Pages 2576-2578

  Kovaleski, S D ^a   Gilgenbach, R M ^a   Ang, L K ^a   Lau, Y Y ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041526972     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122510     Document Type: Article

References (7)

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7. R. A. Lindley, R. M. Gilgenbach, C. H. Ching, and J. S. Lash, J. Appl. Phys. 76, 5457 (1994).