Dose rate and thermal budget optimization for ultrashallow junctions formed by low-energy (2-5 keV) ion implantation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 255-259

  Craig, M ^a   Sultan, A ^a   Reddy, K ^a   Banerjee, S ^a   Ishida, E ^b   Larson, L ^b  

^a The University of Texas at Austin   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041514269     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588457     Document Type: Article

References (12)

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