Substrate ion etching in combined steered cathodic arc-UBM deposition system: effects on interface architecture, adhesion, and tool performance

Surface Engineering

Volumn 16, Issue 2, 2000, Pages 176-180

  Schonjahn C ^a   Lewis, D B ^a   Munz W D ^a   Petrov, I ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHROMIUM; COATING TECHNIQUES; ETCHING; GLOW DISCHARGES; ION BOMBARDMENT; STEEL; SUBSTRATES; SURFACE CHEMISTRY; SURFACE TOPOGRAPHY; TUNGSTEN CARBIDE; VAPOR DEPOSITION;

CATHODIC ARC PLASMA; CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; PHYSICAL VAPOR DEPOSITION; SUBSTRATE ION ETCHING;

SURFACE CLEANING;

EID: 0041495996     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708400101516973     Document Type: Article

References (9)

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