Surface characterization of sputter-deposited Cu-Ta alloys by Auger electron spectroscopy

Science Reports of the Rerearch Institutes Tohoku University Series A-Physics

Volumn 42, Issue 1, 1996, Pages 225-229

  Asami, Katsuhiko ^a   Moriya, Takeshi ^a   Aihara Jr , Tomoyasu ^a   Masumoto, Tsuyoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Amorphous alloy; Auger electron spectroscopy; Copper tantalum alloy; In depth profile; Oxidation; Sputter deposition; Surface analysis

Indexed keywords

EID: 0041461163     PISSN: 00408808     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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