Light-anodization process for high-Jc micron and submicron superconducting junction and integrated circuit fabrication

IEEE Transactions on Applied Superconductivity

Volumn 13, Issue 2 I, 2003, Pages 91-94

  Meng, Xiaofan ^a   Van Duzer, Theodore ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Anodization; Fabrication; Integrated circuits; Superconducting devices

Indexed keywords

ANODIC OXIDATION; COST EFFECTIVENESS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ETCHING; JOSEPHSON JUNCTION DEVICES; LEAKAGE CURRENTS; MASKS;

LIGHT-ANODIZATION;

INTEGRATED CIRCUIT LAYOUT;

EID: 0041441132     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2003.813652     Document Type: Conference Paper

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