The mechanical properties and microstructure of plasma enhanced chemical vapor deposited silicon nitride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 9, Issue 4, 1991, Pages 2464-2468

  Taylor, J Ashley ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041414690     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.577257     Document Type: Article

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