Emission reabsorption laser induced fluorescence (ERLIF) film thickness measurement

Measurement Science and Technology

Volumn 12, Issue 4, 2001, Pages 467-477

  Hidrovo, Carlos H ^a   Hart, Douglas P ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

DELIF; ERLIF; Film thickness; LIF

Indexed keywords

CONSTITUTIVE EQUATIONS; FLUORESCENCE; LASER EXCITATION; LASER OPTICS; LASER PRODUCED PLASMAS; REFLECTION; THICKNESS GAGES; THICKNESS MEASUREMENT;

DEGREE OF EMISSIONS; DELIF; EMISSION REABSORPTION; ERLIF; ILLUMINATION INTENSITY; LASER INDUCED FLUORESCENCE; RESPONSE CHARACTERISTIC; SURFACE REFLECTIVITY;

FILM THICKNESS;

EID: 0041305162     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/12/4/310     Document Type: Article

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