Chemical vapor deposition of Ge thin films using GeEt4: Study of the reaction mechanisms

Annales de Chimie: Science des Materiaux

Volumn 23, Issue 1-2, 1998, Pages 381-384

  El Boucham, J ^a   Amjoud, M ^b   Morancho, R ^c   Maury, F ^c,d   Yacoubi, A ^a  

^a MOULAY ISMAIL UNIVERSITY   (Morocco)

^b FACULTÉ DES SCIENCES ET TECHNIQUES GUÉLIZ   (Morocco)

^c UNIVERSITÉ DE TOULOUSE   (France)

^d ENS Chimie   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041193146     PISSN: 01519107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0151-9107(98)80097-4     Document Type: Article

References (10)

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7. CROSS (R. J.), GLOCKLING (F.), J. Organometal. Chem., 1965, 3, 146.
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