A kinetic model for photochemical vapor deposition from germane and silane

Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 71-78

  Tao, Meng ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Germane; Kinetic model; Photochemical vapor deposition; Silane

Indexed keywords

ACTIVATION ENERGY; FILM GROWTH; GERMANIUM COMPOUNDS; LASER APPLICATIONS; MATHEMATICAL MODELS; PHOTOCHEMICAL REACTIONS; REACTION KINETICS; SILANES; STATISTICAL MECHANICS; THERMAL EFFECTS;

GERMANE; LASER INDUCED PHOTOCHEMICAL VAPOR DEPOSITION; PHOTOEXCITATION; THERMAL DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 0041161644     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00312-X     Document Type: Article

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