|
Volumn 81, Issue 2, 1997, Pages 786-794
|
Physical basis and limitation of universal mobility behavior in fully depleted silicon-on-insulator Si inversion layers
b
NTT CORPORATION
(Japan)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
|
EID: 0041161108
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.364141 Document Type: Article |
Times cited : (30)
|
References (15)
|