Measurement of N in nitrided oxides using spectroscopic immersion ellipsometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1697-1701

  Irene, E A ^a   Liu, Q ^a   Paulson, W M ^b   Tobin, P J ^b   Hegde, R I ^b  

^a University of North Carolina at Chapel Hill   (United States)

^b MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0041029601     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589212     Document Type: Article

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