Study of diamond films grown at low temperatures and pressures by ECR-assisted CVD

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 185-188

  Gupta, S ^a   Morell, G ^a   Katiyar, R S ^a   Gilbert, D R ^b   Singh, R K ^b  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

Characterization; Diamond films; Electron Cyclotron Resonance (ECR); Raman spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; CORRELATION METHODS; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; GRAIN BOUNDARIES; PRESSURE EFFECTS; RESIDUAL STRESSES; SILICON WAFERS; STRESS ANALYSIS; THERMAL EFFECTS; THERMAL STRESS;

RAMAN LINESHAPE ANALYSIS; RAMAN SHIFT; THERMAL INTERFACIAL STRESS;

DIAMOND FILMS;

EID: 0040962779     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00260-x     Document Type: Review

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