Neural network model for global alignment incorporating wafer and stage distortion

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2146-2150

  Ghazanfarian, Amir A ^a   Pease, R F W ^a   Chen, Xun ^a   McCord, Mark A ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040810976     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589342     Document Type: Article

References (6)

1. A. A. Ghazanfarian, R. F. W. Pease, X. Chen, and M. A. McCord, A New Approach to Global Alignment in IC Manufacturing Based on a Neural Network Model, SPIE's 22nd International Symposium on Microlithography, March 1997.
2. T. Kailath, Linear Least-Squares Estimation (Halsted, 1977).
3. S. Haykins, Neural Networks (Macmillan College, 1994).
4. B. Widrow and S. D. Stearns, Adaptive Signal Processing (Prentice-Hall, Englewood Cliffs, NJ, 1985).
5. J. Ye, C. N. Berglund, R. F. W. Pease, G. Owen, R. Jaeger, K. Alexander, and J. Seeger, J. Vac. Sci. Technol. B 13, 2904 (1996).
6. B. Hassibi, A. H. Sayed, and T. Kailath, IEEE Signal Process. Lett. 44, 267 (1996).