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Volumn 85, Issue 1, 1989, Pages 476-480

A subminiature condenser microphone with silicon nitride membrane and silicon back plate

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[No Author keywords available]

Indexed keywords


EID: 0040755792     PISSN: 00014966     EISSN: NA     Source Type: Journal    
DOI: 10.1121/1.397699     Document Type: Article
Times cited : (83)

References (13)
  • 1
    • 0020127035 scopus 로고
    • Silicon as a mechanical material
    • K. Petersen, “Silicon as a mechanical material,” Proc. IEEE 70, 420-457 (1982).
    • (1982) Proc. IEEE , vol.70 , pp. 420-457
    • Petersen, K.1
  • 3
    • 0021407848 scopus 로고
    • Silicon-dioxide electret trans-ducer
    • D. Hohm and R. Gerhard-Multhaupt, “Silicon-dioxide electret trans-ducer,” J. Acoust. Soc. Am. 75, 1297-1298 (1984).
    • (1984) J. Acoust. Soc. Am. , vol.75 , pp. 1297-1298
    • Hohm, D.1    Gerhard-Multhaupt, R.2
  • 4
    • 0022088512 scopus 로고
    • Theoretical considerations in the design of integrated semiconductor sensors applying electrets
    • ED-32,.
    • J. A. Voorthuyzen and P. Bergveld, “Theoretical considerations in the design of integrated semiconductor sensors applying electrets,” IEEE Trans. Electron Devices ED-32, 1185-1190 (1985).
    • (1985) IEEE Trans. Electron Devices , pp. 1185-1190
    • Voorthuyzen, J.A.1    Bergveld, P.2
  • 5
    • 84941488776 scopus 로고
    • Development of a subminiature electret microphone constructed in silicon
    • in Transducers ‘87, Proceedings of the 4th International Conference on Solid-State Sensors Actuators (IEE of Japan, Tokyo,)
    • A. Sprenkels and P. Bergveld, “Development of a subminiature electret microphone constructed in silicon,” in Transducers ‘87, Proceedings of the 4th International Conference on Solid-State Sensors Actuators (IEE of Japan, Tokyo, 1987), pp. 295-298.
    • (1987) , pp. 295-298
    • Sprenkels, A.1    Bergveld, P.2
  • 6
    • 0020843248 scopus 로고
    • ZnO on Si integrated acoustic sensor
    • Sensors Actuators,.
    • M. Royer, J. O. Holmen, M. A. Wurm, O. S. Aadland, and M. Glenn, “ZnO on Si integrated acoustic sensor,” Sensors Actuators 4, 357-362 (1983).
    • (1983) , vol.4 , pp. 357-362
    • Royer, M.1    Holmen, J.O.2    Wurm, M.A.3    Aadland, O.S.4    Glenn, M.5
  • 7
    • 0345521893 scopus 로고
    • Strategies for sensor research
    • in Transducers ‘87, Proceedings of the 4th International Conference Solid-State Sensors and Actuators (IEE of Japan, Tokyo,)
    • R. Muller, “Strategies for sensor research,” in Transducers ‘87, Proceedings of the 4th International Conference Solid-State Sensors and Actuators (IEE of Japan, Tokyo, 1987), pp. 107-111.
    • (1987) , pp. 107-111
    • Muller, R.1
  • 9
    • 84918652050 scopus 로고
    • Kapazitive Siliziumsensoren fur Horschallanwendungen
    • Fortschr. Ber. VDIZ. Reihe 10, Nr. 60 (VDI, D sseldorf,).
    • D. Hohm, “Kapazitive Siliziumsensoren fur Horschallanwendungen,” Fortschr. Ber. VDIZ. Reihe 10, Nr. 60 (VDI, D sseldorf, 1986).
    • (1986)
    • Hohm, D.1
  • 10
    • 0001413452 scopus 로고
    • Miniature cantilever beams fabricated by anisotropic etching of silicon
    • R. D. Jolly and R. S. Muller, “Miniature cantilever beams fabricated by anisotropic etching of silicon,” J. Electrochem. Soc. 127, 2750-2754 (1980).
    • (1980) J. Electrochem. Soc. , vol.127 , pp. 2750-2754
    • Jolly, R.D.1    Muller, R.S.2
  • 11
    • 0018544618 scopus 로고
    • Fabrication of silicon oxynitride masks for x-ray lithography
    • 16, -1964 (1979).
    • L. Csepregi and A. Heuberger, “Fabrication of silicon oxynitride masks for x-ray lithography,” J. Vac. Sci. Technol. 16, 1962-1964 (1979).
    • (1962) J. Vac. Sci. Technol.
    • Csepregi, L.1    Heuberger, A.2
  • 12
    • 0017526255 scopus 로고
    • Stress in ion-implanted CVD Si3N4 films
    • E. P. EerNisse, “Stress in ion-implanted CVD Si3N4 films,” J. Appl. Phys. 48, 3337-3341 (1977).
    • (1977) J. Appl. Phys. , vol.48 , pp. 3337-3341
    • EerNisse, E.P.1
  • 13
    • 0018030427 scopus 로고
    • Anisotropic etching of silicon
    • ED-25,.
    • K. E. Bean, “Anisotropic etching of silicon,” IEEE Trans. Electron Devices ED-25, 1185-1193 (1978).
    • (1978) IEEE Trans. Electron Devices , pp. 1185-1193
    • Bean, K.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.