"Spontaneous" desorption: A controlled phenomenon for surface analysis application? Part I: New evidence for a sputtering process induced by a well localized field enhanced desorption

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 108, Issue 1-2, 1996, Pages 163-172

  Allali, H ^b   Debre O ^b   Lagrange, B ^b   Nsouli, B ^b   Oladipo, A A ^a,b   Thomas, J P ^b  

^a OBAFEMI AWOLOWO UNIVERSITY   (Nigeria)

^b UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040655409     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0168-583X(95)00818-7     Document Type: Article

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