Study on titanium salicide process for thin-film SOI devices

Microelectronic Engineering

Volumn 33, Issue 1-4, 1997, Pages 189-194

  Chen, Jian ^a   Colinge, Jean Pierre ^a  

^a UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

Microwave; Silicon On Insulator; Titanium suicide

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC CONDUCTIVITY OF SOLIDS; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; MICROWAVES; MOSFET DEVICES; NATURAL FREQUENCIES; SEMICONDUCTING FILMS; SILICON ON INSULATOR TECHNOLOGY;

THIN FILM SILICON ON INSULATOR (TFSOI); TITANIUM DISILICIDE;

MICROELECTRONIC PROCESSING;

EID: 0040569581     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-9317(96)00044-5     Document Type: Article

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